▎ 摘　　要

NOVELTY - The pellicle (P100) has a pellicle membrane (PM10) that comprises a nanocrystalline graphene having defects. The nanocrystalline graphene comprises nanocrystalline crystal grains and the grains comprise a two dimensional carbon structure having an aromatic ring structure. The defect of the nanocrystalline graphene is sp3 carbon (C) atom, oxygen (O) atom, nitrogen (N) atom, and carbon vacancy. The pellicle for a photomask comprises two pellets. USE - Photomask pellicle for protecting photomask in exposure process using light including extreme UV (EUV). ADVANTAGE - The pellicle for the photomask having the excellent surface uniformity can be implemented. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) a reticle; and (2) an exposure apparatus for lithography. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of the reticle including the pellicle for the photomask. Pellicle (P100) Pellicle membrane (PM10)