• 专利标题:   Step impedance graphene based three-dimensional inserting sheet type wave absorber, has supporting substrate that adopts inserting type cross symmetrical structure to form device.
  • 专利号:   CN116130972-A
  • 发明人:   SU T, ZHANG D, ZU H, CHEN B, MA S, WU B
  • 专利权人:   UNIV XIDIAN
  • 国际专利分类:   H01Q015/00, H01Q017/00
  • 专利详细信息:   CN116130972-A 16 May 2023 H01Q-015/00 202350 Chinese
  • 申请详细信息:   CN116130972-A CN10102097 10 Feb 2023
  • 优先权号:   CN10102097

▎ 摘  要

NOVELTY - The absorber has an absorber body provided with multiple unit structures. The unit structures are provided with a substrate (1) and a supporting substrate (2) vertical to the substrate. A side of the supporting substrate is attached with a graphene film, where sheet graphene of the graphene film is changed in gradient along incident direction. The supporting substrate adopts inserting type cross symmetrical structure to form an absorber body, where length of the substrate is determined and the supporting substrate is made of polymethyl methacrylate material. USE - Step impedance graphene based three-dimensional inserting sheet type wave absorber. ADVANTAGE - The absorber utilizes the unit structure based on the step impedance graphene using multiple reflection theory, increases section number, reduces step of characteristics section between impedance units to improve impedance matching, so that absorption rate of the absorber body, and can reduce processing cost and improve processing efficiency by adjusting printing times to control thickness of the film, thus changing the graphene of film, reducing processing cost and improving processing efficiency. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a step impedance graphene based three-dimensional plug-type wave absorber preparing method. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a step impedance graphene based three-dimensional inserting sheet type wave absorber. 1Substrate 2Supporting substrate