• 专利标题:   Graphene detector used for photoelectric device, comprises silicon substrate, silicon dioxide/silicon nitride distributed Bragg reflector layer, silicon dioxide layer, thicker silicon nitride layer, graphene layer, colloid quantum dot layer, and metal electrode.
  • 专利号:   CN116171055-A
  • 发明人:   YU M, YANG R, ZENG Y
  • 专利权人:   SHANGHAI MINGKUN SEMICONDUCTOR CO LTD
  • 国际专利分类:   H10K030/60, H10K030/80, H10K071/00, H10K085/00, H10K085/20
  • 专利详细信息:   CN116171055-A 26 May 2023 H10K-030/60 202353 Chinese
  • 申请详细信息:   CN116171055-A CN10184802 28 Feb 2023
  • 优先权号:   CN10184802

▎ 摘  要

NOVELTY - A graphene detector comprises silicon substrate (1), which is provided with silicon dioxide/silicon nitride distributed Bragg reflector (DBR) layer (4) sequentially arranged with silicon dioxide layer (2) and thicker silicon nitride layer (5), which is provided with graphene layer (6), the layer (6) is provided with colloid quantum dot layer (8), and the graphene layer (6) on the periphery of the colloid quantum dot layer (8) is provided with metal electrode (7). USE - Graphene detector used for photoelectric device. ADVANTAGE - The detector solves the problem that the graphene has low light absorption coefficient due to zero band gap structure of graphene in the existing method, so that the responsivity of the photoelectric device is low. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for preparation of graphene detector. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic cross-sectional view of a graphene detector. 1Silicon substrate 2Silicon dioxide layer 3Silicon nitride layer 4Silicon dioxide/silicon nitride distributed Bragg reflector layer 5Thicker silicon nitride layer