▎ 摘　　要

NOVELTY - A graphene patterning method for forming a graphene of a predetermined pattern, involves: bringing a patterning member in which a catalyst metal layer of the predetermined pattern is formed into contact with a substrate (S) having a graphene oxide film (50), where, in bringing the patterning member, the catalyst metal layer is brought into contact with the graphene oxide film. USE - For forming a graphene of a predetermined pattern (claimed). ADVANTAGE - The process is time consuming and decreases manufacturing efficiency; and remove the catalyst metal layers in a post process, and increase the production efficiency of semiconductor devices. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a patterning member configured to make contact with a substrate having a graphene oxide film, comprising: a catalyst metal layer of a predetermined pattern formed on a surface of the patterning member making contact with the graphene oxide film. DESCRIPTION OF DRAWING(S) - The figure shows diagram for explaining the structure of the graphene pattern formed on the substrate. Graphene oxide film (50) Wirings (51) Substrate (S)