▎ 摘　　要

NOVELTY - The apparatus (1) has a growth substrate (3) for forming graphene and carbon nanostructures. The growth substrate extends to define a path. A support layer supports the growth substrate. A reactor vessel (2) enclosed a feedstock application system (6) configured to apply a carbon containing feedstock to an application area (7) of the growth substrate. The application area for the carbon containing feedstock is controllably moveable along the path. A heating system is configured to heat a heated area of the growth substrate, where the heated area is controllably moveable along the path. The growth substrate comprises a metallic film. The growth substrate comprises a salt, an oxosalt, a metal halide or an ionic liquid. The support layer is formed of a material having a higher melting point than the growth substrate. USE - Apparatus for producing graphene and carbon nanostructures. ADVANTAGE - The flexibility of configuring the feedstock application system is advantageous in ensuring complete and uniform application of the carbon containing feedstock. DETAILED DESCRIPTION - The feedstock application system comprises multiple static feedstock outlets spaced along the path, each static feedstock outlet is configured to apply the carbon containing feedstock to a corresponding application area of the growth substrate when the static feedstock outlet is actuated. The static feedstock outlets are configured to be actuated according to a sequence such that an active application area is controllably moveable along the path. The heating system comprises multiple static heating elements spaced along the path, each static heating element is configured to heat a corresponding heated area of the growth substrate. The static heating elements are configured to be actuated according to a sequence such that an active heated area is controllably moveable along the path. The reflection element comprises multiple mirrors configured to be actuated to cause the mirror to redirect radiation energy to a corresponding heated area of the growth substrate. Multiple mirrors are configured to be actuated according to a sequence such that an active heated area is controllably moveable along the path. The reactor vessel comprises a rotating load lock configured to rotate the capture plate to the exterior of the reactor vessel to permit extraction of the removed layer of graphene and carbon nanostructures. An INDEPENDENT CLAIM is included for a method of producing graphene and/or carbon nanostructures inside a reactor vessel involves applying a carbon containing feedstock to an application area of the growth substrate, heating a heated area of the growth substrate, and controlling the application area and the heated area to move along the path. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the apparatus for producing graphene and carbon nanostructures. Apparatus (1) Reactor vessel (2) Growth substrate (3) Feedstock application system (6) Application area (7)