• 专利标题:   Graphene based reflection-type saturable absorber, has reflecting film layer located between saturable absorption layer and substrate layer, where saturable absorbing layer is made of graphene, graphene oxide or functionalized graphene.
  • 专利号:   CN103368059-A, CN103368059-B
  • 发明人:   HU W, LI W, YI L, ZHENG R
  • 专利权人:   UNIV SHANGHAI JIAOTONG
  • 国际专利分类:   B82Y020/00, G02F001/35, H01S003/11
  • 专利详细信息:   CN103368059-A 23 Oct 2013 H01S-003/11 201402 Pages: 7 Chinese
  • 申请详细信息:   CN103368059-A CN10312516 23 Jul 2013
  • 优先权号:   CN10312516

▎ 摘  要

NOVELTY - The absorber has a reflecting film layer located between a saturable absorption layer and a substrate layer, where the saturable absorbing layer is made of graphene, graphene oxide or a functionalized graphene in injection molding mode. The reflection film layer is made of gold film, silver film, copper film or aluminum film. The substrate layer is made of silicon or silicon dioxide. USE - Graphene based reflection-type saturable absorber. ADVANTAGE - The absorber has quick recovery time, adjustable depth and wavelength and low production cost, and realizes practical, simple, efficient, stable and reliable working performance, high damage threshold and convenient large-scale production. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a method for manufacturing a graphene based reflection-type saturable absorber. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of a graphene based reflection-type saturable absorber.