• 专利标题:   Preparing growth graphene of doped germanium single crystal involves using horizontal gradient condensation method to synthesize germanium, cutting polycrystalline germanium, cutting polycrystalline germanium, crucible, quartz tube, quartz cap for cleaning, then processing dry, putting seed crystal.
  • 专利号:   CN114686964-A
  • 发明人:   LI Z
  • 专利权人:   BEIJING TONGMEI XTAL TECHNOLOGY CO LTD
  • 国际专利分类:   C30B011/00, C30B025/00, C30B028/06, C30B029/02, C30B029/08
  • 专利详细信息:   CN114686964-A 01 Jul 2022 C30B-011/00 202270 Chinese
  • 申请详细信息:   CN114686964-A CN10408358 19 Apr 2022
  • 优先权号:   CN10408358

▎ 摘  要

NOVELTY - Preparing growth graphene of doped germanium single crystal involves using the horizontal gradient condensation method to synthesize germanium polycrystalline, and cutting the polycrystalline germanium, cutting polycrystalline germanium, the crucible, quartz tube, quartz cap for cleaning, then processing dry, putting the seed crystal into the seed crystal cavity of the crucible bottom unit and then the polycrystalline germanium, single-layer single crystal graphene in the crucible, the weight ratio of the single crystal graphene polycrystalline germanium is 0.15-0.3:1000, then putting the crucible into the quartz tube, vacuuming until the absolute vacuum degree is 0.2-0.5 Pa, then sealing the quartz tube, putting the sealed quartz tube into a single crystal, furnace to grow germanium single crystal, controlling the axial temperature gradient is 3-5 °C/cm, the radial temperature gradient is less than 2 °C. USE - Method for preparing growth graphene of doped germanium single crystal (claimed). ADVANTAGE - The germanium single crystal has low dislocation density and excellent mechanical properties.