• 专利标题:   Preparation of graphene nano-silicon composite material used as e.g. energy storage materials, involves loading nano-silicon into plasma chemical vapor deposition device, and carrying out vapor deposition method.
  • 专利号:   CN110407198-A
  • 发明人:   YU L, FENG S, WEI X, SHI H
  • 专利权人:   CHINESE ACAD SCI CHONGQING GREEN INTEL, UNIV CHONGQING
  • 国际专利分类:   C01B032/186, C01B033/02
  • 专利详细信息:   CN110407198-A 05 Nov 2019 C01B-032/186 201992 Pages: 7 Chinese
  • 申请详细信息:   CN110407198-A CN10749387 14 Aug 2019
  • 优先权号:   CN10749387

▎ 摘  要

NOVELTY - A graphene nano-silicon composite material is prepared by loading nano-silicon into plasma chemical vapor deposition device, carrying out vapor deposition method, introducing working gas into plasma source, loading carbon source under vacuum environment for 15-60 minutes. USE - A method for preparing graphene nano-silicon composite material used as energy storage materials, photovoltaic materials and heat dissipation materials (claimed).