▎ 摘　　要

NOVELTY - Preparing liquid electronic chemical filtration and purification film involves using dispersed microporous solid zinc oxide-zeolitic imidazolate framework-8 (ZnO-ZIF-8) particles as carbonized precursor, potassium hydroxide as activator, high-temperature carbon-converted porous carbon as raw material, polyvinylidene fluoride (PVDF) with good adhesion as carrier, non-woven fabric porous support layer as support layer, 100-400 mesh nylon mesh as intermediate interlayer, poly(vinyl alcohol) (PAV) as modifier, tungsten disulfide and molybdenum disulfide are additive, polyvinyl pyrrolidone (PVP) is pore-forming agent, nitrogen-nitrogen dimethyl formamide (DMF) is agglomerant, respectively preparing casting solution 1 and casting solution 2, using segmented coating method, preparing non-structural symmetry with shielding fluid potential of the microporous film. USE - Preparing liquid electronic chemical filtration and purification film used in manufacture of semiconductors and other microelectronic devices. Uses include but are not limited to photolithographic liquid, grinding liquid, glass liquid and wet electronic chemical. ADVANTAGE - The method provides liquid electronic chemical filtering and purifying film with improved ion cluster ion agglomeration performance, so as to reduce the particle agglomersation to ensure the stability of the physical properties of the solution. The film material can be used for the whole production preparation-feeding application-recycling industry chain of filtering, purifying and separating solution, comprising inhibiting the fluid potential of the liquid stability of interference. The method can be widely applied to clean high-purity chemical quality control field. The main characteristic is by means of non-structure symmetrical and interface cage type gap absorbing charged ions to balance the double-point layer of the interface, reducing the interface potential to the liquid electric interference of a certain concentration.