• 专利标题:   Graphene field effect transistor quantum dot photoelectric detector, has multilayer thin film structure, multilayer thin film structure comprises silicon substrate layer, first insulating layer and second insulating layer.
  • 专利号:   CN108198897-A
  • 发明人:   ZHENG J, WANG Y, YU K, WEI W, HU E
  • 专利权人:   UNIV NANJING POSTS TELECOM, UNIV NANJING POSTS TELECOM
  • 国际专利分类:   H01L031/0216, H01L031/028, H01L031/113, H01L031/18
  • 专利详细信息:   CN108198897-A 22 Jun 2018 H01L-031/113 201851 Pages: 10 Chinese
  • 申请详细信息:   CN108198897-A CN11316001 12 Dec 2017
  • 优先权号:   CN11316001

▎ 摘  要

NOVELTY - A graphene field effect transistor quantum dot photoelectric detector has multilayer thin film structure, the multilayer thin film structure comprises a silicon substrate layer, a first insulating layer, a second insulating layer, a graphene channel layer, and a quantum dot a photosensitive dielectric layer and a source and a drain, the silicon substrate layer, the first insulating layer, the second insulating layer, the graphene channel layer and the quantum dot photosensitive medium layer are sequentially stacked from bottom to top, the source and the drain are respectively located on the left and right of the quantum dot photosensitive medium layer side. USE - Graphene field effect transistor quantum dot photoelectric detector. ADVANTAGE - The graphene field effect transistor quantum dot photoelectric detector can be prepared with effectively realizing the effective detection of the incident light. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a method for preparing graphene field effect transistor quantum dot photoelectric detector.