▎ 摘　　要

NOVELTY - The pellicle film is stretched on upper end face of a pellicle frame with a pressure-sensitive adhesive agent interposed between the pellicle film and pellicle frame. The pellicle film comprises a main layer made of single crystal silicon. A graphene (10) is provided on both sides of the main layer. USE - Pellicle film for pellicle (claimed) used as dust guard in photolithography during manufacture of semiconductor device, integrated circuit (IC) package, printed board, LCD and organic electroluminescence (EL) display. ADVANTAGE - The extreme UV (EUV) transmittance is increased and sufficient strength is provided even without the need for arranging a support frame. The mechanical strength is improved without damaging the pellicle film during the preparation and use of the pellicle, by providing graphene on both sides. The foreign matters are prevented from passing through the ventilation portion by providing filter to the pellicle frame. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of the pellicle film. Graphene (10) Substrate (20) Thermal release sheet (30)