▎ 摘　　要

NOVELTY - Preparing a surface-enhanced Raman scattering substrate involves preparing a dense-row nanometer micro-sphere two-dimensional colloid crystal layer on a silicon dioxide or silicon (Si) substrate (9). The diameter of a nanometer microsphere (2) in the two-dimensional colloid crystal-silicon dioxide (SiO2) or silicon substrate sample is reduced. The SiO2 layer (3) in the metal film mask-SiO2 mask layer-Si substrate sample. The processed two-dimensional colloid crystal-silicon dioxide or silicon substrate sample is obtained. The noble metal film (6) is prepared on the Si template to obtain the noble metal film Si template with a pyramid structure. The layer of graphene (10) is transferred on a surface of a noble metal pyramid structure (7) to obtain graphene with a pyramid structure of a noble metal film-adhesive-silicon (Si) substrate, finishing the preparation. USE - Method for preparing a pyramid-type surface-enhanced Raman scattering substrate. ADVANTAGE - The method uses two methods of colloid lithography and micro-nano processing and successfully prepares pyramid-type Surface-enhanced Raman scattering (SERS) substrate. The prepared substrate is distributed uniformly in a large-scale range of nano pyramid structures and has high sensitivity and universality. DESCRIPTION OF DRAWING(S) - The drawing shows the schematic view flow chart of a method for preparing a surface-enhanced Raman scattering substrate. Nanometer microsphere (2) SiO2 layer (3) Noble metal film (6) Noble metal pyramid structure (7) Si substrate (9) Graphene (10)