▎ 摘　　要

NOVELTY - Graphene device comprises a high temperature furnace, a vacuum quartz chamber, a high vacuum unit, a gas system, a liquid nitrogen cooling tank, and a slide rack. The vacuum quartz chamber is vertically fixed to the end of the slide rack. The high-temperature furnace and liquid nitrogen cooling tank are installed in the left side and right side ends of the slide rack. The slide rack and a guide slide are connected. The high-temperature furnace has vertical structure with half-open. USE - Used as graphene device. ADVANTAGE - The device achieves continuous growth (claimed), provides fast heating, fast cooling of integration and automation, solves rapid cooling during high temperature treatment of graphene materials, and has compact structure. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the graphene device.