▎ 摘　　要

NOVELTY - The micro-plasma etching processing device has a first movement mechanism and a second movement mechanism which are arranged at intervals. An electric spray nozzle is connected to the first movement mechanism. A rolling-to-rolling mechanism is located at the lower portion of the first movement mechanism. The second movement mechanism is provided for driving for preparing flexible substrate such as polyimide or polyethylene terephthalate substrate of movement with the graphene film. A scanning plasma head is detachably connected to the second movement mechanism. USE - Micro-plasma etching processing device used for patterning graphene thin film. ADVANTAGE - Both direct write type and mask type patterning is performed. The direct write type or mask type is selected according to the working condition. Thus, the efficiency and precision are improved. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a micro-plasma etching processing method. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of the micro-plasma etching processing device. (Drawing includes non-English language text)