• 专利标题:   Weather-resistant fluorine coating of electron beam curing comprises main resin, pigment filling, active diluent, auxiliary agent, rheology auxiliary agent, down-conversion nano powder and primary grinding amount of the main body resin.
  • 专利号:   CN112552813-A
  • 发明人:   TANG Z, RU Z, ZHANG L, ZHOU L
  • 专利权人:   CHANGZHOU WEISIDUN ADHESIVE MATERIALS CO
  • 国际专利分类:   C09D175/14, C09D007/61, H01L031/048
  • 专利详细信息:   CN112552813-A 26 Mar 2021 C09D-175/14 202139 Pages: 15 Chinese
  • 申请详细信息:   CN112552813-A CN11447435 09 Dec 2020
  • 优先权号:   CN11447435

▎ 摘  要

NOVELTY - Weather-resistant fluorine coating of electron beam curing comprises 40-65 pts. wt. main resin, 20-50 pts. wt. pigment filling, 10-20 pts. wt. active diluent, 2-6 pts. wt. auxiliary agent, 1-4 pts. wt. rheology auxiliary agent, 0.5-3 pts. wt. down-conversion nano powder, 20-30 pts. wt. primary grinding amount of the main body resin, 10-45 pts. wt. 2-15 secondary dosage amount of main body resin, 5-8 pts. wt. first grinding dosage amount of active diluent and 2-15 pts. wt. secondary grinding dosage amount of active diluent. USE - Used as weather-resistant fluorine coating of electron beam curing. ADVANTAGE - The weather-resistant fluorine coating: can formed after electron beam cross-linking and curing and corona treatment i.e. not easy to delaminate between the coating and the film substrate, and has uniform thickness, good adhesion, and excellent aging performance. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) weather-resistant fluorine coating formed by the weather-resistant fluorine coating solidified by electron beam; and (2) photovoltaic grid adhesive film, comprising A film substrate, a printing grid area set on the film substrate, a weather-resistant fluorine coating covered on the printing grid area and cured by the electron beam; and (3) preparing the photovoltaic grid adhesive film, comprising preparing the electronic beam cured weather-resistant fluorine coating, printing the fluorine paint on the printing grid area of the glue film base body, cross-linking and solidifying the electron beam and corona treatment.