▎ 摘　　要

NOVELTY - The method involves forming a substrate with a photoresist layer by a lithographic exposure. An etching mask layer is formed on the substrate, where the etching mask layer comprises a photoetching glue column body that is arranged in an array unit. Isotropic etching process is performed, where a base structure layer is formed between the etching mask layer and the substrate. The array unit is fixed with a cone structure. Oxygen plasma etching process is performed to remove the etching mask layer. A graphene layer is formed on the base structure layer. USE - Method for preparing a thermal sound producing device of a thermophone (claimed). ADVANTAGE - The method enables increasing producing efficiency and sound intensity rate. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating a method for preparing a thermal sound producing device of a thermophone. '(Drawing includes non-English language text)'