▎ 摘　　要

NOVELTY - Graphene paper thermal interface material comprises silicon dioxide slurry including 55-65 wt.% water, 0-1 wt.% wetting agent, 0-1 wt.% antifoaming agent, 5-15 wt.% aqueous resin, 0-1 wt.% dispersant, 15 -25 wt.% nano silicon dioxide, 0-1 wt.% pH regulator and 5-15 wt.% anti-settling agent, where preparation nano silicon dioxide aqueous slurry by adding water, dispersant, wetting agent, nano silicon dioxide powder, antifoaming agent, pH regulator, anti-settling agent and aqueous resin into container, and adding raw material while mechanical stirring, after adding raw material, using high speed dispersion, grinding and ultrasonically dispersing for 3 means to dispersing, until fineness is not less than 50 um to obtain nano silicon dioxide aqueous slurry, and where preparation of graphene paper thermal interface material comprising (1) dispersing 1-1000 mg graphene oxide in a mixture of 1-300 ml ethanol and 1-30 ml de-ionized water for ultrasonic treatment. USE - Used as graphene paper thermal interface material. ADVANTAGE - The material: adopts easily available raw materials, and has simple preparation process. DETAILED DESCRIPTION - Graphene paper thermal interface material comprises SiO2 slurry including 55-65 wt.% water, 0-1 wt.% wetting agent, 0-1 wt.% antifoaming agent, 5-15 wt.% aqueous resin, 0-1 wt.% dispersant, 15 -25 wt.% nano silicon dioxide, 0-1 wt.% pH regulator and 5-15 wt.% anti-settling agent, where preparation nano silicon dioxide aqueous slurry by adding water, dispersant, wetting agent, nano silicon dioxide powder, antifoaming agent, pH regulator, anti-settling agent and aqueous resin into container, and adding raw material while mechanical stirring, after adding raw material, using high speed dispersion, grinding and ultrasonically dispersing for 3 means to dispersing, until fineness is not less than 50 um to obtain nano silicon dioxide aqueous slurry, and where preparation of graphene paper thermal interface material comprising (1) dispersing 1-1000 mg graphene oxide in a mixture of 1-300 ml ethanol and 1-30 ml de-ionized water for ultrasonic treatment, (2) adding 100-1000 mu l silicon dioxide in dispersion and carrying out ultrasonic mixing treatment, where the dropping speed cannot be too fast, carrying out dropping at speed of 10-100 mu l/seconds, and ultrasonic dispersion while dropping to ensuring silicon dioxide can be uniformly dispersing on the graphene oxide surface, (3) vacuum filtering and collecting product after ultrasonic treatment, and using de-ionized water to washing for many times until reaching pH is neutral, drying product at 60 degrees C, uncovering silicon dioxide nano-particle modified graphene oxide paper from polytetrafluoroethylene filter film, (4) pre-annealing obtained silicon dioxide-graphene oxide paper in a vacuum oven for 4-12 hours at 140 degrees C to remove the residual moisture and partial oxygen-containing groups in paper, and (5) using Hefei Kejing Model SP-50KTC 2000 degrees C temperature-controlled induction heating furnace to processing above-mentioned thin paper at 1300-1500 degrees C to obtain silicon carbide hybrid graphene paper.