▎ 摘　　要

NOVELTY - Invention relates to a class of roll reactors for chemical deposition from the gas phase of thin graphene films. Claimed is a roll-type CVD reactor including a vacuum working chamber divided into three chambers (a central chamber with heat-insulated heating areas and side chambers with rollers for moving the substrate through the heating area, a substrate tensioning unit, and a drive), a system of heat controllers, a system for moving the substrate, a gas supply system, and a vacuum pumping system. A characteristic feature of the reactor is the fact that the heat-insulated heating area and the system for moving the strip substrate are located inside the vacuum chamber, thus preventing the contact of the metal substrate with the graphene layer applied thereon with the atmosphere until complete cooling. USE - Coatings. ADVANTAGE - Invention ensures creation of a compact apparatus for synthesising high-quality coatings on substrates in the form of a wide strip with lower requirements for heat insulation and vacuum pumping. 4 cl, 2 dwg, 1 ex