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  • 专利标题:   Graphene modified dry-film photoresist for printed wiring board, comprises graphene-modified polyurethane (methyl) acrylate, alkali-soluble resin, photopolymerizable monomer and photoinitiator.
  • 专利号:   CN110221520-A
  • 发明人:   QIAN X, HENG J, HU C, WENG Y
  • 专利权人:   CHANGZHOU QIANGLI ELECTRONIC NEW MATERIA, CHANGZHOU QIANGLI XIANDUAN ELECTRONIC
  • 国际专利分类:   G03F007/004, G03F007/027, H05K003/06
  • 专利详细信息:   CN110221520-A 10 Sep 2019 G03F-007/004 201978 Pages: 15 Chinese
  • 申请详细信息:   CN110221520-A CN10176044 02 Mar 2018
  • 优先权号:   CN10176044

▎ 摘　　要

NOVELTY - A graphene modified dry-film photoresist comprises a graphene-modified polyurethane (methyl) acrylate, an alkali-soluble resin, a photopolymerizable monomer and a photoinitiator. USE - Graphene modified dry-film photoresist for printed wiring board (claimed).