▎ 摘　　要

NOVELTY - The method comprises uniformly mixing a mixture of metal magnesium powder and silica powder by ball milling for preparing a raw material, adding the raw material into a chemical vapor deposition reaction chamber, adding porous magnesia/silicon composite material as a template into the reaction chamber, heating the chamber to a temperature of 800-1100 degrees C, keeping the temperature for 0-60 minutes, and heating the carbon source to react with the mixed gas of hydrogen and argon to expel the air in the reaction chamber out, where the gas flow is 5-50 SCCM and the reaction time is 5-30 minutes. USE - The method is useful for preparing a vesicular structure graphene material. DETAILED DESCRIPTION - The method comprises uniformly mixing a mixture of metal magnesium powder and silica powder by ball milling for preparing a raw material, adding the raw material into a chemical vapor deposition reaction chamber, adding porous magnesia/silicon composite material as a template into the reaction chamber, heating the chamber to a temperature of 800-1100 degrees C, keeping the temperature for 0-60 minutes, heating the carbon source to react with the mixed gas of hydrogen and argon to expel the air in the reaction chamber out, where the gas flow is 5-50 SCCM and the reaction time is 5-30 minutes, cooling the magnesium oxide/silicon/graphene composite structure at a cooling speed of 10-300 degrees C per min, and dipping the composite structure in hydrochloric acid, etching liquid of hydrofluoric acid or sodium hydroxide to remove the template.