• 专利标题:   Semiconductor device e.g. transistor has channel formed of bi-layer graphene film.
  • 专利号:   JP2009277803-A
  • 发明人:   HARADA N, OFUCHI M
  • 专利权人:   FUJITSU LTD
  • 国际专利分类:   H01L029/786, H01L051/05, H01L051/30, H01L051/40
  • 专利详细信息:   JP2009277803-A 26 Nov 2009 H01L-051/30 200980 Pages: 17 Japanese
  • 申请详细信息:   JP2009277803-A JP126441 13 May 2008
  • 优先权号:   JP126441

▎ 摘  要

NOVELTY - The transistor has its channel region formed of a bi-layer graphene film (103). The gate electrode (105) to which an electric field is applied is formed in a direction orthogonal to the channel region. USE - Semiconductor device e.g. transistor (claimed). ADVANTAGE - The transistor exhibits excellent operating characteristics, as graphene film is used for the channel of the transistor. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) semiconductor device manufacturing method; and (2) transistor. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic structure of the graphene transistor. (Drawing includes non-English language text) Substrate (101) Insulation layer (102) Bi-layer graphene film (103) Gate insulation film (104) Gate electrode (105)