• 专利标题:   Forming layered material, comprises arranging a two-dimensional layered material on base material comprising Moire interference and adding material or removing material at location of Moire interferences.
  • 专利号:   US2021245395-A1
  • 发明人:   JEONG Y, WANG M C
  • 专利权人:   UNIV SOUTH FLORIDA
  • 国际专利分类:   C04B041/50, B28B011/10, C04B041/45, C04B035/14, C01B032/19, B28B011/08
  • 专利详细信息:   US2021245395-A1 12 Aug 2021 B28B-011/08 202192 English
  • 申请详细信息:   US2021245395-A1 US170103 08 Feb 2021
  • 优先权号:   US971144P, US170103

▎ 摘  要

NOVELTY - Forming a layered material, comprises: arranging a two-dimensional layered material (2DLM) on a base material comprising at least one Moire interference; and adding material or removing material at a location of the Moire interferences. USE - The method is useful for forming a layered material. ADVANTAGE - The method: utilizes interfacial materials that can further exhibit extent properties, e.g. superconductivity or superlubricity, based upon their superlattice parameters; utilizes layered sheets of graphene at a turbostratic angle of 1.1degrees exhibit superconducting properties; and is highly controlled, repeatable, and generalizable. DESCRIPTION OF DRAWING(S) - The figure illustrates an image of Moire interference. Rotationally incommensurate stacking interface (100) Periodic structure (105a) Incommensurate rotational angle (110)