▎ 摘　　要

NOVELTY - The method involves scattering a silicon oxide microsphere on a surface of a substrate. The substrate with the silicon oxide microsphere is placed in a reaction furnace. A protective gas inletting process is carried out in the reaction furnace. Air is discharged from the reaction furnace. A reaction furnace heating process is performed under reducing gas i.e. hydrogen gas and protective gas i.e. argon. Carbon source gas i.e. methane is introduced into the reaction furnace. A graphene layer is formed on a surface of the silicon oxide microsphere within predetermined reaction time. USE - Graphene film ball preparation method. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating a graphene film ball preparation method. '(Drawing includes non-English language text)'