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  • 专利标题:   Formation of graphene laminate pattern involves forming metallic microfilm pattern on substrate, evaporating microfilm pattern, depositing graphene layer on microfilm pattern, forming graphene pattern and repeating process.
  • 专利号:   KR2015077343-A
  • 发明人:   JUNG J, PARK J
  • 专利权人:   UNIV SEJONG IND ACAD COOP GROUP
  • 国际专利分类:   C01B031/04, H01B013/00
  • 专利详细信息:   KR2015077343-A 07 Jul 2015 H01B-013/00 201558 Pages: 24
  • 申请详细信息:   KR2015077343-A KR187725 24 Dec 2014
  • 优先权号:   KR165163

▎ 摘　　要

NOVELTY - A metallic microfilm pattern is formed on a substrate. The metallic microfilm pattern is evaporated, and simultaneously a graphene layer is deposited on the metallic microfilm pattern to form graphene pattern. The process is repeated alternately to obtain graphene laminate pattern. USE - Formation of graphene laminate pattern (claimed).