• 专利标题:   Processing growth of graphene by chemical vapor deposition on an insulating substrate by using solid carbon source comprises solid uniformly paving carbon source powder on the surface of the insulating substrate, and growing.
  • 专利号:   CN108190872-A
  • 发明人:   HOU S, YUAN Y, WANG H, ZHENG Y, LIU L, ZHANG J
  • 专利权人:   UNIV SHANDONG
  • 国际专利分类:   C01B032/186
  • 专利详细信息:   CN108190872-A 22 Jun 2018 C01B-032/186 201847 Pages: 6 Chinese
  • 申请详细信息:   CN108190872-A CN10175670 02 Mar 2018
  • 优先权号:   CN10175670

▎ 摘  要

NOVELTY - Processing growth of graphene by chemical vapor deposition on an insulating substrate by using solid carbon source comprises solid uniformly paving carbon source powder on the surface of the insulating substrate, using gas containing hydrogen as carrier gas, growing at 500-800 degrees C for 0.5-3 hours by chemical vapor deposition to obtain graphene. USE - The method is useful for processing growth of graphene by chemical vapor deposition on an insulating substrate by using solid carbon source. ADVANTAGE - The method; produces product has excellent crystallinity, does not easy to agglomerate and stack; has no polymer and surfactant residues; excellent electronic conduction efficiency and sensing performance.