• 专利标题:   Preparation of monocrystalline graphene involves performing primary heat treatment of metal substrate, growing monocrystalline graphene, etching, reducing density of graphene, growing graphene, etching and repeating growing and etching.
  • 专利号:   CN103643288-A, CN103643288-B
  • 发明人:   CHENG H, MA T, REN W
  • 专利权人:   INST METAL RES CHINESE ACAD SCI
  • 国际专利分类:   C30B025/00, C30B029/02
  • 专利详细信息:   CN103643288-A 19 Mar 2014 C30B-029/02 201432 Pages: 13 Chinese
  • 申请详细信息:   CN103643288-A CN10637514 29 Nov 2013
  • 优先权号:   CN10637514

▎ 摘  要

NOVELTY - Preparation of monocrystalline graphene having crystal size of 1-4 inches and mobility of 10000 cm2V-1s-1, involves performing primary heat treatment of metal substrate in presence of carrier gas containing hydrogen, growing monocrystalline graphene on the surface of metal substrate at high-temperature using carbon source gas by catalytic cracking process, controlling concentration of hydrogen and carbon, etching, reducing density of graphene, growing graphene, etching and repeating growing and etching steps. USE - Preparation of monocrystalline graphene is used for nano-electronic device, transparent conductive film for display, solar battery electrode, gas sensor and thin film electronic device. DETAILED DESCRIPTION - Preparation of monocrystalline graphene having crystal size of 1-4 inches and mobility of 10000 cm2V-1s-1, involves performing primary heat treatment of metal substrate in presence of carrier gas containing hydrogen, growing monocrystalline graphene on the surface of metal substrate at high-temperature using carbon source gas by catalytic cracking process, controlling concentration of hydrogen and carbon, etching, reducing density of graphene, reducing the number of graphene to 1-2 per 10 square inch, adjusting the concentration of hydrogen and carbon, growing graphene, etching and repeating growing and etching steps.