• 专利标题:   Ultra-high-temperature resistant nano polyamide-imide film comprises polyamide-imide comprising polyamide-imide resin, organic solvent, diluent and additives, and modified graphene oxide material containing nano-sized modified graphene.
  • 专利号:   CN106497053-A
  • 发明人:   DU J, YANG J, LU H, LIU B, YANG Q, YANG H, WANG Y, GUO B, YU K, CUI R, ZHAO Y, LI G
  • 专利权人:   UNIV SHAANXI SCI TECHNOLOGY
  • 国际专利分类:   C08J005/18, C08K013/02, C08K003/04, C08K005/01, C08K005/07, C08K005/12, C08K009/04, C08K009/06, C08L079/08
  • 专利详细信息:   CN106497053-A 15 Mar 2017 C08L-079/08 201735 Pages: 9 Chinese
  • 申请详细信息:   CN106497053-A CN10888276 11 Oct 2016
  • 优先权号:   CN10888276

▎ 摘  要

NOVELTY - An ultra-high-temperature resistant nano polyamide-imide film comprises 100-120 pts. wt. polyamide-imide and 2-5 pts. wt. modified graphene oxide material. The polyamide-imide comprises 20-35 pts. wt. polyamide-imide resin, 20-60 pts. wt. organic solvent, 0.1-10 pts. wt. diluent, 0.1-20 pts. wt. additive (A), 0.1-20 pts. wt. additive (B) and 0.1-20 pts. wt. additive (C). The modified graphene oxide material comprises 100 pts. wt. nano-sized modified graphene, 20-40 pts. wt. silane coupling agent and 2-3.5 pts. wt. cationic surfactant. USE - Ultra-high-temperature resistant nano polyamide-imide film (claimed). DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for preparation method of ultra-high-temperature resistant nano polyamide-imide film, which involves (1) preparing polyamide-imide solution by dissolving 20-35 pts. wt. polyamide-imide resin in 20-60 pts. wt. organic solvent, adding 0.1-10 pts. wt. diluent, 0.1-20 pts. wt. additive (A), 0.1-20 pts. wt. additive (B) and 0.1-20 pts. wt. additive (B), (2) subjecting 100 pts. wt. modified fused graphene material, 20-40 pts. wt. silane coupling agent and 2-3.5 pts. wt. cationic surfactant to dispersion treatment, (3) mixing 2-5 pts. wt. modified fumed graphene material with 100-120 pts. wt. polyamide-imide solution to obtain polyamide-imide solution system, (4) spreading the polyamide-imide solution system evenly on a clean substrate and evaporating the solvent to obtain a film and carrying out cross-linking reaction of the film by imidization reaction.