▎ 摘　　要

NOVELTY - The method involves adopting electron beam exposure system for exposing the negative photoresist first layer on graphene film. The metal silver is deposited in the square groove by electron-beam thermal evaporation technology. The adopting peeling craftwork is obtained by the negative photoresist removal. The overlay aligned photoresist exposure process is performed. The positive photoresist is removed through lift-off technology. The second-layer graphene film is transferred to the dielectric layer, and the sandwich-type metal super-structure is obtained. USE - Manufacturing method of sandwich type ultra-fast photoelectric detection metal super-structure. ADVANTAGE - The metal-structure is prepared in sandwich layer of noble metal-material structure. The super-fast photoelectric detection is realized effectively. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating the manufacturing process of sandwich type ultra-fast photoelectric detection metal super-structure. (Drawing includes non-English language text)