▎ 摘　　要

NOVELTY - The device has a pattern formation jig that is arranged on a substrate (10) formed with a graphene (G). A solution supply unit is provided for feed solution (STN) on the substrate. A jig conveying unit is provided for transferring the solute pattern above pattern formation jig with evaporation-induced self assembly (EISA). A pattern shape unit is provided for forming the graphene pattern. The soluble pattern contains polymethyl methacrylate, metal particle and inorganic material particle. The substrate is made of polyethylene terephthalate and silicon dioxide/silicon. USE - Manufacturing device of graphene pattern used in electronic device such as transparent conductive film, sensor and FET. ADVANTAGE - The graphene pattern can be manufactured effectively without including the lithographic process. The manufacturing cost of the graphene pattern can be reduced. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of the manufacturing device of graphene pattern. Substrate (10) Cylindrical roller (110) Graphene (G) Polymethyl methacrylate pattern (PP) Solution (STN)