• 专利标题:   Preparing photoresist-graphene conductive composite system used in e.g. sensor conductive line and capacitor, involves providing mixture comprising graphene and photoresist, coating mixture on substrate, and then drying to prepare film, and then using mask pattern plate to expose obtained film.
  • 专利号:   CN116009358-A
  • 发明人:   XIN Y, WANG J, PANG Y, YI M, ZOU Y
  • 专利权人:   UNIV BEIJING NORMAL
  • 国际专利分类:   G03F007/004, G03F007/027, G03F007/16, G03F007/20, G03F007/26
  • 专利详细信息:   CN116009358-A 25 Apr 2023 G03F-007/16 202342 Chinese
  • 申请详细信息:   CN116009358-A CN11500441 28 Nov 2022
  • 优先权号:   CN11500441

▎ 摘  要

NOVELTY - Preparing photoresist-graphene conductive composite system, involves (a) providing a mixture comprising graphene and a photoresist, (b) coating the mixture on the substrate, and then drying to prepare film, then using mask pattern plate to expose the obtained film, and (c) using the developing solution to process the exposed material to remove the uncrosslinked portion to obtain the conductive composite system of photoresist-graphene material, where the photoresist comprises a photopolymerizable ionic liquid. USE - Method for preparing photoresist-graphene conductive composite system used in a sensor, a conductive line, a capacitor, an electronic device, a surface adsorption material and a catalyst carrier (claimed). ADVANTAGE - The photoresist-graphene conductive composite system has excellent conductivity, mechanical property and thermal conductivity. The surface absorbing material and catalyst carrier have good application prospect. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a photoresist-graphene conductive composite system obtained by the method.