▎ 摘　　要

NOVELTY - The method involves transferring the graphene on the substrate, while making the substrate using the photolithographic process. The residue of the graphene is removed from the surface using the rapid thermal processing process in five minutes to thirty minutes. The imprint of the graphene is removed using the mechanical exfoliation process and chemistry deposition process. USE - Method for eliminating the adsorbates on the surface of the graphene. ADVANTAGE - The residue of the graphene is removed from the surface using the rapid thermal processing process in five minutes to thirty minutes, and thus ensures the efficiency in eliminating the adsorbates on the surface of the graphene, and hence effectively removes the impurity and deformity from the graphene surface, while reducing the thermal processing about the adsorbates eliminating method. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of an adsorbate eliminating method. (Drawing includes non-English language text).