• 专利标题:   Method for preparing graphene field effect transistor, involves transferring graphene material on substrate, preparing source and drain electrodes, performing photolithography followed by applying medium and forming graphene nanobelts.
  • 专利号:   CN105914148-A, CN105914148-B
  • 发明人:   JIN Z, PENG S, ZHANG D, WANG S, SHI J, MAO D
  • 专利权人:   INST MICROELECTRONICS CHINESE ACAD SCI, INST MICROELECTRONICS CHINESE ACAD SCI
  • 国际专利分类:   B82Y030/00, B82Y040/00, H01L021/336, H01L029/10, H01L029/16, H01L029/78
  • 专利详细信息:   CN105914148-A 31 Aug 2016 H01L-021/336 201664 Pages: 9 Chinese
  • 申请详细信息:   CN105914148-A CN10269687 27 Apr 2016
  • 优先权号:   CN10269687

▎ 摘  要

NOVELTY - A graphene field effect transistor preparing method involves transferring a graphene material on a substrate, preparing a source electrode and a drain electrode on the graphene material, performing a photolithography to form graphene strips on the graphene material at channel region, depositing a high dielectric constant medium on the graphene strips followed by applying the high dielectric constant medium as a mask to the graphene strips, and forming graphene nanobelts on the electrode to obtain product. USE - Method for preparing graphene field effect transistor. ADVANTAGE - The transistor has high switching ratio, and can be prepared in simple and cost effective manner. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a graphene field effect transistor prepared by the method.