▎ 摘　　要

NOVELTY - The deposition process involves heating a porous metal template at a temperature of 500-2000 degrees C. A gas mixture is passed, which includes a carrier gas carrying along a vapor of an organometallic compound and a carbon precursor gas and a boron nitride precursor gas through the heated metal template. The heating temperature causes the decomposition of the organometallic compound vapor into metal particles, and the precursor gasses into graphene domains and/or hexagonal-boron nitride domains to form a three-dimensional interconnected porous network of graphene and/or hexagonal-boron nitride. USE - Chemical vapor deposition process for forming three-dimensional (3D) foam-like structure (claimed) for use in e.g. electrochemistry, solar cells, filler, thermal interface material, sensing or biological applications. ADVANTAGE - The deposition process deposits the metal particles together with carbon and/or boron nitride decomposed from the respective precursor gas and avoids a premature termination of the deposition process. The deposition process produces denser, more stable and easier to handle foam-like structures. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a foam-like structure that comprises a three-dimensional interconnected porous network of graphene and/or the hexagonal-boron nitride. DESCRIPTION OF DRAWING(S) - The drawing shows the schematic diagram of the metal activated vapor aided template growth process of 3D foam-like structures.