• 专利标题:   Two dimensional material manufacturing device comprises substrate supply unit for continuously supplying flexible substrate in state of blocking external gas, and catalyst layer deposition unit set adjacent to substrate supply unit.
  • 专利号:   KR2021014861-A
  • 发明人:   SHIN U C
  • 专利权人:   SHIN U C
  • 国际专利分类:   C01B032/186
  • 专利详细信息:   KR2021014861-A 10 Feb 2021 C01B-032/186 202116 Pages: 16
  • 申请详细信息:   KR2021014861-A KR092824 31 Jul 2019
  • 优先权号:   KR092824

▎ 摘  要

NOVELTY - Two dimensional material manufacturing device comprises a substrate supply unit (100) for continuously supplying a flexible substrate in a state of blocking external gas, a catalyst layer deposition unit (120) installed adjacent to the substrate supply unit (110) and configured to deposit a catalyst layer on the flexible substrate in a state of blocking external gas, a 2D material deposition unit (130) installed adjacent to the catalyst layer deposition unit and configured to deposit a 2D material on the flexible substrate on which the catalyst layer is deposited in an external gas blocking state, and a substrate recovery unit (140) installed adjacent to the 2D material deposition unit and configured to recover the flexible substrate on which the 2D material is deposited while blocking external gas. USE - The device is useful for manufacturing 2D material e.g. graphene. ADVANTAGE - The device: is suitable for mass production; has high efficiency and high productivity; and realizes continuous process. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the 2D material manufacturing device. Substrate supply unit (110) Catalyst layer deposition unit (120) Two dimensional material deposition unit (130) Substrate recovery unit (140) Substrate pretreatment unit (150)