• 专利标题:   Nano pattern manufacturing method, involves forming pattern layer on transfer layer that is formed on substrate, where transfer layer is made of graphene film, organic and inorganic clay structure film or carbon nano sheet materials.
  • 专利号:   KR2013138877-A
  • 发明人:   CHOI Y J, HWANG J O, JEONG S J, KIM B H, KIM J Y, KIM S O, SHIN D O
  • 专利权人:   KOREA ADVANCED INST SCI TECHNOLOGY
  • 国际专利分类:   H01L021/027
  • 专利详细信息:   KR2013138877-A 20 Dec 2013 H01L-021/027 201413 Pages: 19
  • 申请详细信息:   KR2013138877-A KR061922 11 Jun 2012
  • 优先权号:   KR061922

▎ 摘  要

NOVELTY - The method involves forming a pattern layer on a transfer layer. The transfer layer is formed on a substrate. The transfer layer is made of graphene film, organic and inorganic clay structure film or carbon nano (CN) sheet materials. The transfer layer is separated from the former substrate and transferred to another substrate. Block copolymer is formed on the transfer layer. Surface energy of the transfer layer is controlled. USE - Nano pattern manufacturing method. ADVANTAGE - The method enables manufacturing a nano pattern, so that the nano pattern can be formed on a flexible printed circuit board or non-planar substrate. The method enables inserting two-dimensional sheets between the substrate and the block copolymer and applying nano molding to the substrate in a better manner. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for the following: (1) a nano pattern (2) a nano mold manufacturing method. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating a nano pattern manufacturing method.'(Drawing includes non-English language text)'