▎ 摘　　要

NOVELTY - The method involves moving a CVD of graphene and a metal substrate together into a sealed cavity. The cavity is vacuumized and filled with inert gas. The cavity is heated and reacted with graphene gas. Heating and providing of graphene gas are stopped after reaction is completed. The inert gas is maintained. The sealed cavity is cooled to room temperature and is placed under optical mirror for observation. USE - Method for visualizing distribution of chemical vapor deposition (CVD) of graphene fold on surface of metal substrate. ADVANTAGE - The process is simple and easy. Since the process removes large wrinkles near the surface of the graphene, optical microscope can observe the distribution of nano-scale wrinkles by low magnification. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the etching system for visualizing distribution of CVD of graphene fold on surface of metal substrate.(Drawing includes non-English language text) Air inlet path (1) Outlet air path (2) Support (3) Heating furnace housing (4) Quartz tube (5)