• 专利标题:   Preparation of self-contained ion-glue film gated graphene FET used in large-scale integrated circuit, involves obtaining silicon substrate, preparing metal electrode on substrate, and using two-dimensional material transfer platform to transfer graphene.
  • 专利号:   CN114695124-A
  • 发明人:   PU Y, HU H, NIU W, ZHANG X, WANG L
  • 专利权人:   UNIV NANJING POST TELECOM
  • 国际专利分类:   H01L021/336, H01L029/16, H01L029/51
  • 专利详细信息:   CN114695124-A 01 Jul 2022 H01L-021/336 202284 Chinese
  • 申请详细信息:   CN114695124-A CN10363700 08 Apr 2022
  • 优先权号:   CN10363700

▎ 摘  要

NOVELTY - Preparation of self-contained ion-glue film gated graphene FET involves (1) obtaining a silicon substrate, and preparing metal electrodes on the silicon substrate; (2) adhering a screened graphene sample on polyvinyl alcohol (PVA), and transferring the graphene sample on PVA to the metal electrode using a two-dimensional material transfer platform to obtain a graphene FET device; and (3) forming an ionic liquid gel film on the graphene FET device by shear transfer. USE - Preparation of self-contained ion-glue film gated graphene FET used in large-scale integrated circuit. ADVANTAGE - The method reduces the negative influence of the traditional complex operation to the surface of the sample graphene, and effectively improves the preparation efficiency and success rate of graphene FET.