▎ 摘　　要

NOVELTY - The frame has a hollow, cylindrical pellicle frame that supports a pellicle membrane. The gas passes through a first inner surface (2) and a first outer surface (4) and a section. A first frame (1) has multiple first pores (3), and a second frame (5) surrounds the first frame comprising a second inner surface (6) and a second outer surface (8) in contact with the first outer surface. Multiple second pores (7) are formed so that gas can pass through the second inner surface and the second outer surface and a section therebetween. The second pores have a larger average diameter than the first pores. USE - Porous pellicle frame for extreme ultraviolet lithography. ADVANTAGE - The frame prevents inflow of particles while ensuring ventilation, and easily discharges heat generated in extreme UV photolithography process to outside. DESCRIPTION OF DRAWING(S) - The drawing shows a plan view of the pellicle frame for extreme ultraviolet lithography. First frame (1) First inner surface (2) First pore (3) First outer surface (4) Second frame (5) Second inner surface (6) Second pore (7) Second outer surface (8)