• 专利标题:   Pellicle film used for preventing dust from adhering to photomask or reticle, comprises layers laminated to each other and/or layers provided with one or more openings.
  • 专利号:   WO2021172354-A1, JP2021135403-A, TW202201121-A, CN115087926-A, KR2022146493-A, US2022413379-A1, EP4113208-A1
  • 发明人:   TAKADA N, SEKI K, KODERA Y, SEKIGAZUNORI, YUTAKA G
  • 专利权人:   TOPPAN PRINTING CO LTD, TOPPAN PRINTING CO LTD, TOPPAN INC, TOPPAN INC
  • 国际专利分类:   G03F001/62, C01B032/168, C01B032/186, C01B032/194, B32B003/26, B32B009/00, B32B009/04, C01B032/05, G03F001/64
  • 专利详细信息:   WO2021172354-A1 02 Sep 2021 202178 Pages: 41 Japanese
  • 申请详细信息:   WO2021172354-A1 WOJP006852 24 Feb 2021
  • 优先权号:   JP031985, CN80013586, KR730607

▎ 摘  要

NOVELTY - Pellicle film comprises layers laminated to each other and/or layers provided with one or more openings having a width or diameter in the range of 10-500 nm. USE - The pellicle film is used for preventing dust from adhering to the photomask or reticle. ADVANTAGE - The pellicle film has a low absorption rate for extreme UV lithography, has excellent heat resistance, does not get easily damaged and has excellent in-plane uniformity and performance such as light transmittance and adsorptivity. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) a pellicle membrane having layers laminated on each other and having one or more openings in two or more of the layers; (2) a pellicle comprising the pellicle film comprising pellicle film and frame supporting the pellicle film; (3) a film comprising graphene sheets laminated on each other and having one or more openings in one or more of the graphene sheets; and (4) a method for producing a graphene sheet, which comprises forming a mask layer that covers a portion of the metal layer on the metal layer, and generating graphene in a portion of the metal layer that is not covered by the mask layer.