▎ 摘　　要

NOVELTY - The pellicle portion comprises a core layer, and a support layer pattern that supports the pellicle portion from a lower portion, and in the core layer or the pellicle portion. The core layer or the pellicle, one portion of a region supported by the support layer pattern. The core layer is silicon material which contains one of single crystal, polycrystalline, and amorphous, or a silicon compound material containing oxygen, carbon, or nitrogen in silicon or Carbon Nano Tube, graphite, or graphene, or molybdenum, tantalum, titanium, vanadium, Cobalt, copper, nickel, zirconium, niobium, palladium, flat titanium, iron, zinc, tin, Chromium, aluminum, manganese, cadmium, magnesium, lithium, selenium, hafnium, yttrium, indium, Tungsten metals or alloys, Boron, Aluminium, Gallium, Indium, Arsenic, Antimony, Bismuth of one non-metal or a compound. A silicide or mixture contains silicon in metal and non-metal, a compound containing at least one of oxygen, nitrogen, and carbon in the material. USE - Pellicle attached to a photomask used in an EUV lithography process for use in preventing cracking and destruction of a thin film. ADVANTAGE - An external impact is prevented from being directly transmitted to the pellicle thin film, by forming an uneven shape on the pellicle thin film. Even if a temporary or continuous external stimulus is applied, cracking and destruction of the pellicle thin film is prevented. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a pellicle manufacturing method. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of a pellicle. Core layer (10) Blocking layer pattern (12a) Support layer pattern (21a) Pellicle portion (30) Support portion (40)