▎ 摘　　要

NOVELTY - The method comprises providing (102) a first substrate, and radiating (104) a laser beam through a transmitting phase mask on the first substrate, where the transmitting phase mask comprises a pattern and radiating the laser beam through the transmitting phase mask forms a graphene pattern on a first surface of the first substrate. The first substrate comprises a polymer, a metal, a semiconductor, and/or an insulating material. The radiating step comprises applying a single shot of laser pulse through the transmitting phase mask to form the graphene pattern on the first substrate. USE - The method is useful for forming a pattern on a substrate such as highly oriented pyrolytic graphite substrate for forming a graphene device (all claimed). ADVANTAGE - The method allows rapid formation of the pattern on the substrate in a cost effective manner. DETAILED DESCRIPTION - The method comprises providing (102) a first substrate, and radiating (104) a laser beam through a transmitting phase mask on the first substrate, where the transmitting phase mask comprises a pattern and radiating the laser beam through the transmitting phase mask forms a graphene pattern on a first surface of the first substrate. The first substrate comprises a polymer, a metal, a semiconductor, and/or an insulating material. The radiating step comprises applying a single shot of laser pulse through the transmitting phase mask to form the graphene pattern on the first substrate. The method further comprises: radiating the laser beam through a second mask on the substrate; disposing (106) a transferring agent on the first surface of the first substrate after the radiating step such that the transferring agent covers the graphene pattern; removing (108) the transferring agent along with attached the graphene pattern from the first substrate; transferring (110) the graphene pattern from the transferring agent to a second substrate using a solvent; curing the transferring agent before to the removing step; and removing the transferring agent from the second substrate and heating the second substrate to remove residual solvent from the second substrate. The second mask comprises: a second pattern and radiating the laser beam through the second mask forms the second pattern on the first surface of the substrate; a transmitting phase mask; and/or a shadow mask. The transferring step comprises dispensing the solvent onto the transferring agent to release the graphene pattern from the transferring agent. The graphene pattern comprises graphene ribbons. INDEPENDENT CLAIMS are included for: (1) a graphene device; and (2) a system for forming a pattern on a substrate. DESCRIPTION OF DRAWING(S) - The figure shows a flow diagram of a method for forming a pattern on a substrate. Providing a first substrate (102) Radiating a laser beam through a transmitting phase mask on first substrate to form a pattern on the first substrate (104) Disposing a transferring agent on the first substrate (106) Removing the transferring agent with the attached pattern from the first substrate (108) Transferring the pattern to a second substrate. (110)