▎ 摘　　要

NOVELTY - Low-cost graphene thin film perovskite solar cell sequentially comprises a substrate, a dense layer, a perovskite layer, a mesoporous layer, a graphene layer, a back electrode, a photoresist layer and an antireflection layer from inside to outside, where the thickness of the perovskite layer, the mesoporous layer and the graphene layer are equal, the thickness of the photoresist layer is half of the thickness of the substrate, and the thickness of the dense layer and the antireflection layer are equal, the graphene layer is a graphene sheet comprising more than fifteen layers of graphene layered stacks, the thickness of the graphene sheet is 30-45 nm, the thickness of the substrate is 1.25-2.05 mm, and the thickness of the antireflection layer is 15-20nm. USE - The graphene thin film perovskite solar cell is used in solar cell application such as organic solar battery and dye-sensitized solar battery, Schottky junction photovoltaic device, and multi-solar battery based on silicon nanometre structure. ADVANTAGE - The low-cost film graphene solar battery has high conductive rate, high efficiency, and high conductivity, and can be prepared in a simple and fast manner at low cost. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for preparing the low-cost graphene thin film perovskite solar cell, which involves (i) performing material preparation by (a) preparing a ceramic board, and opening a molding groove in the middle of the ceramic board with the same size as the molding solar cell, (b) preparing a spin coater, setting up the above-mentioned ceramic plate in the spin coater turntable, ensuring that the ceramic plate is kept horizontal in the spin coater turntable, and ensuring that there is a gap between the spin coater turntable and the ceramic plate, (c) preparing two groups of micro vibration motors and installing symmetrically on both sides of the bottom of the spin coater turntable, and (d) sterilizing the above-mentioned utensils by using UV germicidal lamps, (ii) performing bottom layer preparation by (a) pouring the substrate liquid to the preset molding tank of the ceramic plate, controlling the spin coater turntable to start to rotate, controlling the spin coater turntable rotation speed to 30-60 rpm, and forming the substrate after the substrate liquid is solidified and formed, and (b) taking out the ceramic plate from the spin coater turntable, and using a single-chamber plasma vapor deposition equipment to carry out chemical vapor deposition treatment on the inner substrate surface of the ceramic plate, and the substrate surface forms a dense layer, (iii) performing middle-level processing by returning the ceramic plate to the original position in the spin coater, filling the prefabricated perovskite spin coating solution to the spin coater, controlling the spin-coater to spin-coat the perovskite spin-coating solution on the surface of the dense layer, after the first stage of spin coating, controlling the rotating speed of the spin coater to reduce to 100-200 rpm, starting the second stage of spin coating, controlling the spin coater to stop after the second stage of spin coating, and leaving still for 10-20 minutes, the surface of the dense layer forms a perovskite layer, (iv) performing main layer molding by (a) filling the prefabricated mesoporous spin coating liquid to the spin coater, and controlling the spin coater to spin the mesoporous spin coating liquid on the surface of the perovskite layer, controlling the micro vibration motor at the bottom of the spin coater to turn on, controlling the spin coater and the micro vibration motor to stop after continuous vibration and spin coating for 8-16 minutes, (b) after the spin coater is stopped, paving the prepared graphene sheet on the surface of the uncured mesoporous layer, pouring the prefabricated photoresist solution to the spin coater, continuously spin-coating the photoresist solution on the graphene layer by using a spin coater, controlling the rotating speed of the spin coater to 600-800 rpm, spin coating until the photoresist solution is exhausted, stopping, and paving the prepared back electrode on the surface of the graphene layer for photolithography in the glue solution, and ensuring that the back electrode and the graphene layer are attached, and (v) performing surface treatment by (a) completely curing the photoresist solution to form a photoresist layer, taking out the ceramic plate from the spin coater, soaking the ceramic plate in a prefabricated acid washing solution, washing until the photoresist residue on the surface of the photoresist layer completely falls off and taking out, and (b) placing the acid-washed ceramic plate back in the spin coater turntable, pouring the prefabricated anti-reflection liquid to the spin-coater, controlling the spin-coater to spin-coat the anti-reflection liquid on the surface of the photoresist layer, controlling the spin coating speed at 1800-2050 rpm, stopping the machine after spin coating for 5-10 minutes, after the anti-reflection liquid is completely cured, forming an anti-reflection layer on the surface of the photoresist layer to obtain the blank of the solar cell, assembling the solar cell blank in a solar cell frame to obtain the low-cost graphene thin film perovskite solar cell.