• 专利标题:   Preparing graphene/oxide composite optical thin film involves forming oxide thin film by taking high-purity metal as metal element sputter source of oxide, where substrate is pretreated with acetone.
  • 专利号:   CN106939405-A
  • 发明人:   WU H, ZHAO X, CHEN Z, HUANG K, LU X, ZHANG C
  • 专利权人:   UNIV NANJING INFORMATION SCI TECHNOLOG
  • 国际专利分类:   C23C014/08, C23C014/34, C23C008/02, C23C008/20
  • 专利详细信息:   CN106939405-A 11 Jul 2017 C23C-014/08 201755 Pages: 8 Chinese
  • 申请详细信息:   CN106939405-A CN10176713 23 Mar 2017
  • 优先权号:   CN10176713

▎ 摘  要

NOVELTY - Preparing graphene/oxide composite optical thin film involves forming oxide thin film by taking high-purity metal as the metal element sputter source of the oxide. The substrate is pretreated with acetone. The substrate is dried using high pressure nitrogen drying process. The distance between the base and the target frame is adjusted. The three electrodes from the substrate are kept out. The substrate and a target are made of heating pulse electric source. The substrate is provided with layer of plasma glow. USE - Method for preparing graphene/oxide composite optical thin film (claimed). DETAILED DESCRIPTION - Preparing graphene/oxide composite optical thin film involves forming oxide thin film by taking high-purity metal as the metal element sputter source of the oxide. The substrate is pretreated with acetone. The substrate is dried using high pressure nitrogen drying process. The distance between the base and the target frame is adjusted. The three electrodes from the substrate are kept out. The substrate and a target are made of heating pulse electric source. The substrate is provided with layer of plasma glow. The overlapped membrane enhances the efficiency of metal matrix. The metal oxide film is prepared by filling argon gas and oxygen to the furnace body. The air pressure in the furnace reaches 5-30 Pascal. The substrate voltage is regulated to 200-300V. The substrate is bombarded for 5-10 minutes. The body voltage is adjusted to 300-500Volt. The target voltage is adjusted to 900-1000Volt. The base current is controlled at 1.0-2.5A. The source current is 0.5-2.0A. The coating thickness is controlled at 10-30 minutes. The high pure reduction-oxidation graphene paper is used as target. The target frame is adjusted in a sputtering chamber. The argon gas is filled in a furnace body, such that air pressure in the furnace reaches 30-35Pascal. The substrate cathode voltage is adjusted to 200-300V. The graphite target voltage is adjusted to 750-850V. The substrate cathode current is controlled at 1.8-2.2A. The source current 0.8-1.2A. The heat preservation time is 10-30 minutes.