• 专利标题:   Distortion resistive element for e.g. pressure sensor, has distortion resistance film which is formed of graphene or transition-metal dichalcogenide having monoatom layer thickness or several atoms layer thickness.
  • 专利号:   WO2017022577-A1
  • 发明人:   TORITA T, YOSHII Y, NOMURA M, NAKAGAWARA O, HIGAI S
  • 专利权人:   MURATA MFG CO LTD
  • 国际专利分类:   G01L001/18, G01L009/04, G01P015/12
  • 专利详细信息:   WO2017022577-A1 09 Feb 2017 G01L-009/04 201715 Pages: 29 Japanese
  • 申请详细信息:   WO2017022577-A1 WOJP071924 26 Jul 2016
  • 优先权号:   JP155811

▎ 摘  要

NOVELTY - The element has a silicon substrate (1) and a distortion resistance film (8) which is formed in a surface of the silicon substrate. The distortion resistance film is formed of a graphene or a transition-metal dichalcogenide having monoatom layer thickness or several atoms layer thickness. USE - Distortion resistive element for pressure sensor, strain-gauge, acceleration sensor, and angular velocity sensor (all claimed). ADVANTAGE - The distortion resistive element with a high gage factor and a high detection sensitivity can be obtained. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of the pressure sensor. Silicon substrate (1) Silicon dioxide layer (2) Opening (6) Displacement portion (7) Distortion resistance film (8)