• 专利标题:   Graphene transistor for inverter of electronic device, has graphene channel including graphene region opposite to another graphene region based on doped graphene region and formed with Fermi level different from that of doped region.
  • 专利号:   US2017229587-A1, KR2017093547-A, US10109746-B2
  • 发明人:   LEE B H, KIM Y J, KIM S Y
  • 专利权人:   GWANGJU INST SCI TECHNOLOGY, GWANGJU INST SCI TECHNOLOGY
  • 国际专利分类:   H01L021/04, H01L027/12, H01L029/16, H01L029/66, H01L029/786, H01L029/10, H01L029/417, H01L029/772
  • 专利详细信息:   US2017229587-A1 10 Aug 2017 H01L-029/786 201756 Pages: 19 English
  • 申请详细信息:   US2017229587-A1 US424154 03 Feb 2017
  • 优先权号:   KR015088

▎ 摘  要

NOVELTY - The transistor has a passivation layer (190) shielding a graphene channel (140) and a doping metal layer (160). The channel includes a doped graphene region (143) formed below the doping metal layer and formed in predetermined conductive type, a first graphene region (141) formed at a side of the doped graphene region and formed with a Fermi level different from that of the doped graphene region, and a second graphene region (142) opposite to the first graphene region based on the doped graphene region and formed with a Fermi level different from that of the doped graphene region. USE - Graphene transistor for an inverter (claimed) of an electronic device. ADVANTAGE - The transistor implements three channel resistance states and forms three stable output states due to drain current. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of a graphene transistor. Graphene channel (140) Graphene regions (141, 142) Doped graphene region (143) Doping metal layer (160) Passivation layer (190)