• 专利标题:   Top floated gate Van der Waals heterojunction device, comprises hexagonal boron nitride nanosheet and graphene nanosheet sequentially stacked on molybdenum disulfide bottom electrode device.
  • 专利号:   CN110323223-A
  • 发明人:   HE J, HUANG W, YIN L
  • 专利权人:   NAT CENT NANOSCIENCE TECHNOLOGY CHINA
  • 国际专利分类:   B82Y040/00, G11C011/42, H01L021/8239, H01L027/105
  • 专利详细信息:   CN110323223-A 11 Oct 2019 H01L-027/105 201986 Pages: 14 Chinese
  • 申请详细信息:   CN110323223-A CN10408844 16 May 2019
  • 优先权号:   CN10408844

▎ 摘  要

NOVELTY - A top floated gate Van der Waals heterojunction device comprises a hexagonal boron nitride nanosheet and a graphene nanosheet sequentially stacked on a molybdenum disulfide bottom electrode device, where the stacked molybdenum disulfide bottom electrode device, the hexagonal boron nitride nanosheet and the graphene nanosheet have a completely overlapping region in the vertical direction. USE - Top floated gate Van der Waals heterojunction device. ADVANTAGE - The top floated gate Van der Waals heterojunction device has better effect of enhancing the performance of the device, and multi-bit photoelectric large memory window, high on/off ratio, low dark current, rapid optical response, better stability and multi-bit storage performance. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for the following: (1) a method for preparing top floated gate Van der Waals heterojunction device (2) a nonvolatile memory device.