• 专利标题:   Method of making device, such as polymer-based flexible semiconductor device, involves transferring biopolymer membrane onto handling wafer, where passivation layer is formed on biopolymer membrane, and graphene is transferred.
  • 专利号:   US10559694-B1
  • 发明人:   SON K, YANG B, SEO H C, WONG D, MOON J
  • 专利权人:   HRL LAB LLC
  • 国际专利分类:   H01L029/16, H01L029/66, H01L029/786
  • 专利详细信息:   US10559694-B1 11 Feb 2020 H01L-029/786 202017 Pages: 18 English
  • 申请详细信息:   US10559694-B1 US590298 09 May 2017
  • 优先权号:   US118424P, US590298

▎ 摘  要

NOVELTY - The method involves transferring a biopolymer membrane onto a handling wafer, where a passivation layer is formed on the biopolymer membrane. The graphene is transferred onto the passivation layer, where the graphene is patterned to form a graphene mesa. The source contact is formed on the graphene mesa, where a drain contact s formed on the graphene mesa. The passivation layer for surrounding the graphene mesa, a source contact and a drain contact to expose the biopolymer membrane is etched. The biopolymer membrane is released from the handling wafer, where the biopolymer membrane is dried after transferring the biopolymer membrane onto the handling wafer. The gate insulator (17) on the graphene mesa is formed, where a gate electrode is formed on the gate insulator. USE - Method of making a device, such as a polymer-based flexible semiconductor device. ADVANTAGE - The biopolymer membrane is transferred onto a handling wafer, where a passivation layer is formed on the biopolymer membrane, and hence enables reducing the signal-to-noise ratio and operates the transistors with a high drain voltage and a high gate potential. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic cross-sectional view of a biocompatible graphene transistor fabricated on a bio-integrative biopolymer membrane. Bio-integrative biopolymer membrane (10) Channel (12) Source (14) Drain (16) Gate insulator (17) Gate (18) Polymer passivation layer (20)