▎ 摘　　要

NOVELTY - The method involves using graphite (4) as an evaporating material. A substrate is placed in a vacuum chamber (1). The graphite is heated to sublimation under vacuum and deposited on the substrate after sublimation. The vacuum chamber is first filled with an inert gas and then evacuated. The heating adopts a step-wise heating method such as the graphite is first heated by electric heating, and then the surface of the graphite is heated by a laser (5). The heating is performed by a sputtering heating method. The heating uses a graphite electrode to generate an arc heating method. The substrate is capable of being etched. The substrate has two layers which are closely opposed to each other. A protective layer is adhered to the back side of substrate. A release layer is provided on the surface of the substrate to deposit sublimated graphite on the surface of the release layer. USE - Method for producing graphene. ADVANTAGE - The graphene film product can be directly produced according to the use requirement, only by selecting different substrates. The hard substrate products or coiled soft substrate products can be produced with simple production process and low production cost. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for an apparatus for carrying out method for producing graphene comprises a vacuum chamber comprises a heating device and a substrate locator. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the apparatus for carrying out method for producing graphene. Vacuum chamber (1) External vacuum device (2) Heating device (3) Graphite (4) Laser (5)