▎ 摘　　要

NOVELTY - Depositing graphene-based layer on a substrate (2) by chemical vapor deposition using at least one hydrocarbon as starting material for chemical reaction into a vacuum chamber (1), comprises forming plasma within the vacuum chamber using at least one magnetron (3) containing at least one target made of catalytically active metal including chemical element having order number 21-30, 39-48, 57, 72-80 and 89, and sputtering the target in such a way that the proportion in the graph-based layer of incorporated target particles is less than 1 at.%. USE - The method is useful for depositing graphene-based layer on substrate (claimed). ADVANTAGE - The method is energy efficient and economical, and produces substrates with high quality. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the coating device. Vacuum chamber (1) Substrate (2) Magnetron (3) Copper target (4) Inlet (6)