• 专利标题:   Construction of self-driven ultra-fast photoelectric detector based on van der Waals metal electrode involves forming heterojunction of vertical structure on silicon dioxide layer, and forming source and drain electrodes.
  • 专利号:   CN114361289-A
  • 发明人:   XU G, LIU D
  • 专利权人:   UNIV BEIJING TECHNOLOGY
  • 国际专利分类:   H01L031/032, H01L031/113, H01L031/18
  • 专利详细信息:   CN114361289-A 15 Apr 2022 H01L-031/113 202244 Chinese
  • 申请详细信息:   CN114361289-A CN10023809 10 Jan 2022
  • 优先权号:   CN10023809

▎ 摘  要

NOVELTY - Constructing self-driven ultra-fast photoelectric detector based on van Dehua metal electrode comprises using silicon/silica substrate, two-dimensional metal iron germanium telluride, graphene and thin layer tungsten diselenide material heterojunction, where the silicon substrate is a silicon dioxide layer, the silicon oxide layer is a metal iron germanium telluride -semiconductor (tungsten diselenide) - metal (graphene) heterojunctions, and forming a vertical structure on the silicon dioxide base layer, and the two metal electrodes are respectively connected to the metal electrode through an electrode adhesion layer to form a source and a drain electrode. USE - The method is used for constructing self-driven ultra-fast photoelectric detector based on van der Waals metal electrode in imaging, optical communication, sensing and biomedicine. ADVANTAGE - The photoelectric detector has simple structure, dark current is almost zero, high response rate, fast response rate and high sensitivity.